Origin of enhanced thermal atomic layer etching of amorphous HfO2
URL: https://avs.scitation.org/doi/10.1116/6.0001614
Authors: Mullins, Rita / Gutiérrez-Moreno, Julio / Nolan, Michael
Research Lines: Ab-Initio Electronic Structure Methods
Publication: Journal of Vacuum Science & Technology
Place Published: AVS
Volume / Pagination: 40 / 022604
Palabras clave: amorphous, Atomic Layer Etching, HfO2, surfaces